Ion plating

If this interface is not properly cleaned, then it can result into a weaker coating or poor adhesion.

They are many different processes to vacuum deposited coatings in which they are used for various applications such as corrosion resistance and wear on the material.

By using a reactive gas or vapor in the plasma, films of compound materials can be deposited.

The ion plating process was first described in the technical literature by Donald M. Mattox of Sandia National Laboratories in 1964.

In the 1970's, high-rate DC magnetron sputtering has shown that bombardment densified the films and helped the hardness of materials.