Krypton fluoride laser

With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of semiconductor integrated circuits, industrial micromachining, and scientific research.

KrF and ArF excimer lasers are widely incorporated into high-resolution photolithography machines, one of the critical tools required for microelectronic chip manufacturing in nanometer dimensions.

The light from this UV laser is strongly absorbed by lipids, nucleic acids and proteins, making it useful for applications in medical therapy and surgery.

The most widespread industrial application of KrF excimer lasers has been in deep-ultraviolet photolithography[2][3] for the manufacturing of microelectronic devices (i.e., semiconductor integrated circuits or "chips").

[2][3][11] With phenomenal advances made in equipment and technology in the last two decades, modern semiconductor electronic devices fabricated using excimer laser lithography now total more than $400 billion in annual production.

The electra laser at NRL is a KrF laser that demonstrated over 90,000 shots in 10 hours.
The electra laser at NRL is a KrF laser that demonstrated over 90,000 shots in 10 hours.