It is particularly effective in industries like semiconductor manufacturing, optics, and medical device production, where precision and gentle cleaning are crucial.
[1] The transducer creates acoustic waves at a higher frequency (typically 0.8–2 MHz) than ultrasonic cleaning (20-200 kHz).
In ultrasonic devices, cavitation occurs throughout the tank, and all sides of submerged parts are cleaned.
For this reason, megasonic transducers are typically built using arrays of closely spaced square or rectangular piezoelectric devices that are bonded to a substrate.
Special carriers are sometimes used to reduce any obstructions that may prevent parts of the wafer surface from being cleaned.