Ion beam deposition

[citation needed] Cathodic arc sources are used particularly for carbon ion deposition.

Molecular ion beam deposition employs electrospray ionization or MALDI sources.

[3] The ions are then accelerated, focused or deflected using high voltages or magnetic fields.

In IBD they are used to select a single, or a range of ion species for deposition in order to avoid contamination.

[8] These limitations make ion beam sputtering less efficient for large-scale applications.