atomic force microscope (AFM) has been used to manipulate hydrogen-terminated silicon surfaces.
The infrared spectrum of hydrogen-terminated silicon shows a band near 2090 cm−1, not very different from νSi-H for organic hydrosilanes.
[7] One group proposed to use the material to create digital circuits made of quantum dots by removing hydrogen atoms from the silicon surface.
It serves as a precursor for various surface functionalization techniques and is also essential in the formation of silicon-on-insulator (SOI) wafers.
This process can be monitored using techniques such as X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM).