Chlorotrifluorosilane is an inorganic gaseous compound with formula SiClF3 composed of silicon, fluorine and chlorine.

[4][5][6] At high temperatures above 500 °C silicon tetrafluoride can react with phosphorus trichloride to yield some SiClF3.

[7] Silicon tetrachloride can react with trifluoro(trichloromethyl)silane to yield SiClF3 and CCl3SiCl3.

Chlorotrifluorosilane reacts with trimethylstannane ((CH3)3SnH) at room temperature to make trifluorosilane in about 60 hours.

[18] Proposed uses include a dielectric gas with a high breakdown voltage, and low global warming potential, a precursor for making fluorinated silica soot, and a vapour deposition gas.

[20][21] This addition compound is made by mixing trimethylamine vapour with Chlorotrifluorosilane and condensing out a solid at -78 °C.

If this was allowed to soak in trimethylamine liquid for over eight hours, a diamine complex formed (2Me3N·SiClF3).