Thermochemical nanolithography

[1] Riedo and collaborators demonstrated that TCNL can produce local chemical changes with feature sizes down to 12 nm at scan speeds up to 1 mm/s.

[2][3] The AFM thermal cantilevers are generally made from a silicon wafers using traditional bulk and surface micro-machining processes.

[11] Nanoscale templates on polymer films for the assembly of nano-objects such as proteins and DNA have also been created[12] and crystallization of ferroelectric ceramics with storage densities up to 213 Gb/in2 have been produced.

[14] Thermo-mechanical scanning probe lithography relies on the application of heat and force order to create indentations for patterning purposes (see also: Millipede memory).

Thermal scanning probe lithography (t-SPL) specializes on removing material from a substrate without the intent of chemically altering the created topography.