An electron diffraction study shows that silicon-nitrogen bond length (173.5 pm) and Si-N-Si bond angle (125.5°) to be similar to disilazane (in which methyl groups are replaced by hydrogen atoms) suggesting that steric factors are not a factor in regulating angles in this case.

4) In gas chromatography, HMDS can be used to silylate OH groups of organic compounds to increase volatility, this way enabling GC-analysis of chemicals that are otherwise non-volatile.

[9] In pyrolysis-gas chromatography-mass spectrometry, HMDS is added to the analyte to create silylated diagnostic products during pyrolysis, in order to enhance detectability of compounds with polar functional groups.

[10] In plasma-enhanced chemical vapor deposition (PECVD), HMDS is used as a molecular precursor as a replacement to highly flammable and corrosive gasses like SiH4, CH4, NH3 as it can be easily handled.

HMDS is used in conjunction with a plasma of various gases such as argon, helium and nitrogen to deposit SiCN thin films/coatings with excellent mechanical, optical and electronic properties.