[2] The compound has been extensively studied because of its applications in the semiconductor industry, as a precursor for the deposition of fils of silicon nitride[5][6][7] and silicon carbonitride[8] and as an additive in photoresist formulations.

The approximate bond angles are N-Si-N ≈ 108°, Si-N-Si ≈ 127°, C-Si-C ≈ 109°, H-C-H ≈ 112°.

[10][11] The compound was obtained in 1948 by Brewer and Haber by introducing dimethyldichlorosilane Si(CH3)2Cl2 into liquid ammonia NH3, and then extracting the precipitate with benzene.

The reaction yields a mixture of compounds, chiefly the trimer and the tetramer octamethyltetrasilazane.

[1] The yield can be improved by converting the tetramer, through reaction with hydrogen in the presence of suitable catalysts.